We develop custom Atomic Layer Processing tools for your research needs.
-Efficient use of precursors and power-saving features
-Thin films with strong adhesion characteristics
-Reproducible results and excellent repeatability
-Many different substrates can be used for deposition;
-Deposited materials include (but not limited to)
*Oxides: Al2O3, HfO2, SiO2, TiO2, Ta2O5, ZrO2, V2O5, ZnO, ZnO:Al, WO3, NiO, MgO, RuO2
*Nitrides: TiN, TaN, Si3N4, AlN, GaN, InN, BN, WN, HfN
*Metals: Pt, Ru, Pd, Ni, W, Au
OKYAY TECHNOLOGY R & D
We added Plasma ALD Systems to our product portfolio.
Palo Alto, CA
OKYAY TECHNOLOGY R&D ENGINEERING GLOBAL ALD SOLUTIONS PARTNER