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OKYAYTECH ALD

CUSTOM ALD TOOLS FOR YOUR RESEARCH

OKYAY TECHNOLOGIES ALD SYSTEM

We develop custom Atomic Layer Processing tools for your research needs. 

  • Up to 8 precursor channels, heated precursor lines
  • Plasma process option, hollow cathode plasma sources up to 600W
  • In-situ metrology, ellipsometer
  • Ozone process option, ozone generator
  • MFC controlled plasma gases (N2, Ar, H2, O2 etc)
  • Load lock option
  • Custom gas delivery manifolds
  • Custom vacuum reactors, optical ports, electrical feedthrough
  • NEW Atomic Layer Etching Tool

 

-Efficient use of precursors and power-saving features

-Thin films with strong adhesion characteristics

-Pinhole/Particle-free films

-Reproducible results and excellent repeatability

-Many different substrates can be used for deposition;

-Deposited materials include (but not limited to)

*Oxides: Al2O3, HfO2, SiO2, TiO2, Ta2O5, ZrO2, V2O5, ZnO, ZnO:Al, WO3, NiO, MgO, RuO2

*Nitrides: TiN, TaN, Si3N4, AlN, GaN, InN, BN, WN, HfN

*Metals: Pt, Ru, Pd, Ni, W, Au

*Sulfides: ZnS

 

 

GALLERIES

OKYAY TECH ALD SYSTEM

OKYAY TECH T4
OKYAY TECH T8