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OKYAY TECH T8

OKYAY TECH ALD System Features and Options:

– Chamber for wafer substrates up to 200 mm across

– 2 – 8 Precursor Lines (Solid/Liquid/Gas and H2O co-reactant)

– Optional heated precursor lines

– 3D Surround CoatingTM High Aspect Ratio capability

– Non-planar object coating option with volumetric chamber

– In-situ metrology options

– Laptop Computer & Full Graphical System Software

– Maintenance Software releases for life of tool

 

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